James K. Stronski is a partner in the New York office of Frommer Lawrence & Haug LLP. Mr. Stronski specializes in intellectual property law and related litigation.

Mr. Stronski clerked for a Federal District Court Judge in the Southern District of New York from 1988 to 1990. Thereafter, Mr. Stronski has been in private practice, specializing in litigation and intellectual property matters.

Mr. Stronski has particular expertise in litigation concerning patents, trademarks, trade secrets, copyrights and unfair competition. His litigation experience includes motions for preliminary injunction, bench and jury trials as well as appeals.

Mr. Stronski also actively advises clients on trademark matters, including trademark clearance and prosecution matters, licensing, and inter partes proceedings before the Trademark Trial and Appeal Board.

Mr. Stronski received an A.B. degree from Dartmouth College and a law degree from Fordham University School of Law, where he was managing editor of the Fordham International Law Journal. Mr. Stronski has written articles on the law and is a member of several bar association committees focused on intellectual property matters and litigation. He is a member of the New York Bar and the bar of several federal courts, including the United States Supreme Court.


Bar Admission

New York (1989)


Dartmouth College (A.B., 1984)
Fordham University (J.D., 1988)
Managing Editor,
Fordham International
Law Journal (1987-1988)
Law Clerk,
Honorable Judge Shirley Wohl Kram
U.S. District Court,
Southern District of New York


Federal Bar Council
Member, Inn of Court
American Bar Association
Member, Intellectual Property Law
and Litigation Sections
New York State Bar Association
Member, Entertainment, Arts
and Sports Law Section
New York Intellectual
Property Law Association
Member, Committee on
International Trademark Association
Editorial Board,
The Trademark Reporter

Primary Office

745 Fifth Avenue
New York, New York 10151
Telephone: (212) 588-0800
Fax: (212) 588-0500

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