GRACE L. PAN
gpan@flhlaw.com

Grace L. Pan is a partner in the New York office of Frommer Lawrence & Haug LLP. Ms. Pan is an intellectual property counselor and litigator, with special expertise in polymer chemistry, recombinant technology, herbicides, pharmaceutical compositions and formulations, vaccines, organic and inorganic compounds, medical devices, semiconductor-related technology and mechanical devices. She also practices in the areas of trademark, trade secret, copyright and unfair competition law.

Ms. Pan's practice includes all aspects of patent prosecution before the U.S. Patent and Trademark Office. Ms. Pan represents clients from the United States, Japan and Taiwan in state and federal trial courts and in various federal appeals courts, principally in the semiconductor, chemistry, biotechnological and mechanical fields. She is also experienced in all aspects of client counseling, including negotiation, due diligence, non-infringement and invalidity opinions. Ms. Pan also prosecutes and defends foreign patent applications, particularly in Taiwan and Japan, and has argued before the Trial Examiners at the Japan Patent Office. In addition, Ms. Pan also has expertise in obtaining, defending, and licensing copyright, trademark and domain name applications (including ICANN proceedings).

Ms. Pan received her B.S. in Biology and Chemistry from Lewis and Clark College and B.S. in Biochemistry from Scripps College in 1986, and her J.D. from Northwestern School of Law in 1992. She is admitted to the Supreme Court of New Jersey, the Court of Appeals for the Federal Circuit and the United States Patent and Trademark Office.

Ms. Pan is an active member of the American Bar Association, Intellectual Property Law Section of the American Bar Association, New York Intellectual Property Law Association, Los Angeles Intellectual Property Law Association, American Intellectual Property Law Association, Southern California Chinese Lawyers Association, National Asian Pacific American Bar Association and American Chemical Society.




Position:Partner

Bar Admission


New Jersey (1997)
Registered to practice before
U.S. Patent and Trademark Office

Education


Scripps College
(B.S., Biochemistry, 1986)
Lewis & Clark College
(B.S., Biology and Chemistry, 1986)
Northwestern School of Law
(J.D., 1992)
Phi Delta Phi and Iota Sigma Pi

Member


American Bar Association
Member, Committee on Patent,
Trademark and Copyright Law and
Intellectual Property Section
Los Angeles Intellectual
Property Law Association
New York Intellectual Property
Law Association
American Intellectual Property
Law Association
Southern California Chinese
Lawyers Association
American Chemical Society
National Asian Pacific American
Bar Association

Languages


Japanese
Mandarin Chinese
Taiwanese

Primary Office


745 Fifth Avenue
New York, New York 10151
Telephone: (212) 588-0800
Fax: (212) 588-0500



Copyright 2005 Frommer Lawrence & Haug LLP. All Rights Reserved.
Click here to view Web Site Disclaimer.